PLASMA CHEMISTRY AND PLASMA PROCESSING 期刊简介

PLASMA CHEMISTRY AND PLASMA PROCESSING
英文简介:

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

中文简介:(来自Google、百度翻译)

发表有关等离子体化学和等离子体处理的基础和应用研究的原始论文,该期刊的范围包括处理等离子体,从非热等离子体到热等离子体,基础等离子体研究以及特定等离子体应用的研究。此类应用包括但不限于等离子体催化,环境处理 (包括液体和气体的处理),等离子体的生物应用 (包括等离子体医学和农业),表面改性和沉积,粉末和纳米结构合成,能量应用 (包括等离子体燃烧和重整),资源回收,等离子体和电化学的耦合,和等离子蚀刻。还要求研究等离子体中的化学动力学以及等离子体与表面的相互作用。提交的材料必须包括对等离子体作用的实质性考虑,例如相关的等离子体化学,等离子体物理或等离子体-表面相互作用; 仅考虑使用等离子体处理的材料或物质的特性的手稿不在该杂志的范围内。

期刊ISSN
0272-4324
影响指数
3.117
最新CiteScore值
4.60 查看CiteScore评价数据
最新自引率
11.30%
官方指定润色网址
https://www.deeredit.com/?type=ss1
投稿语言要求

Improve the quality of the paper, eliminate grammar and spelling errors, increase readability, ensure accurate communication of viewpoints, enhance academic reputation, and increase the chances of the paper being accepted.

建议点击这个网址:https://www.deeredit.com/?type=ss2,资深审稿专家为您评估稿件质量,提供针对性改进建议,最终可助您极大提升目标期刊录用率

期刊官方网址

hot

https://www.peipusci.com/?type=9
杂志社征稿网址

hot

https://www.peipusci.com/?type=10
通讯地址
SPRINGER, 233 SPRING ST, NEW YORK, USA, NY, 10013
偏重的研究方向(学科)
工程技术-工程:化工
出版周期
Quarterly
出版年份
1981
出版国家/地区
UNITED STATES
是否OA
No
SCI期刊coverage
Science Citation Index Expanded(科学引文索引扩展)
NCBI查询
PubMed Central (PMC)链接 全文检索(pubmed central)
PLASMA CHEMISTRY AND PLASMA PROCESSING 期刊中科院JCR 评价数据
最新中科院JCR分区
大类(学科)
小类(学科)
综述期刊
工程技术
ENGINEERING, CHEMICAL(工程:化工)3区 PHYSICS, APPLIED(物理:应用)3区 PHYSICS, FLUIDS & PLASMAS(物理:流体与等离子体)3区
最新的影响因子
3.117
最新公布的期刊年发文量
年度总发文量 研究类文章占比
119 94.96%
总被引频次 57
影响因子趋势图
近年的影响因子趋势图(整体平稳趋势)

2022年预警名单预测最新

PLASMA CHEMISTRY AND PLASMA PROCESSING 期刊CiteScore评价数据
最新CiteScore值
4.60
年文章数 119
SJR
0.513
SNIP
1.053
CiteScore排名
序号 类别(学科) 排名 百分位
1 Chemical Engineering Chemical Engineering (all) #71/279
2 Chemical Engineering Surfaces, Coatings and Films #32/123
3 Chemical Engineering Chemistry (all) #109/398
4 Chemical Engineering Condensed Matter Physics #117/411
CiteScore趋势图
CiteScore趋势图
PLASMA CHEMISTRY AND PLASMA PROCESSING 投稿经验(由下方点评分析获得,5人参与,1624人阅读)
投稿录用比例: 较易
审稿速度: 较慢,6-12周
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